The fracture toughness of polysilicon microdevices

被引:13
作者
Ballarini, R [1 ]
Mullen, RL [1 ]
Kahn, H [1 ]
Heuer, AH [1 ]
机构
[1] Case Western Reserve Univ, Dept Civil Engn, Cleveland, OH 44106 USA
来源
MICROELECTROMECHANICAL STRUCTURES FOR MATERIALS RESEARCH | 1998年 / 518卷
关键词
D O I
10.1557/PROC-518-137
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
The development of polysilicon fracture mechanics specimens with characteristic dimensions comparable to those of typical microelectromechanical systems (MEMS) devices is presented. The notched cantilever specimens are fully integrated with a simultaneously microfabricated electrostatic actuator, which allows on-chip resting of the specimens without the need of an external loading device, and without any possible influences from external sources. Under monotonic loading, the average maximum tensile stress (strength) and average nominal fracture toughness were measured as 4.2 GPa and 3.5 MPa-m(1/2) for boron-doped specimens, and 5.0 Cpa and 4.0 MPa-m(1/2) for undoped specimens. An average modulus of rupture of 3.3 GPa and average nominal toughness of 2.7 MPa-m(1/2) were measured for specimens cracked under cyclic resonance loading. The differences between the monotonic loading and cyclic loading data are attributed to fatigue initiation of a sharp crack from the 1 mu m radius notch. The experimental data is consistent with a critical flaw size in the fabricated devices, a, that is related to the fracture toughness K-Ic by K-Ic/a(1/2)=4600 MPa.
引用
收藏
页码:137 / 142
页数:4
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