Midgap levels in both n- and p-type 4H-SiC epilayers investigated by deep level transient spectroscopy -: art. no. 122104

被引:74
作者
Danno, K [1 ]
Kimoto, T [1 ]
Matsunami, H [1 ]
机构
[1] Kyoto Univ, Dept Elect Sci & Engn, Nishikyo Ku, Kyoto 6158510, Japan
关键词
D O I
10.1063/1.1886904
中图分类号
O59 [应用物理学];
学科分类号
摘要
Midgap levels in n- and p-type 4H-SiC epilayers have been investigated by deep level transient spectroscopy (DLTS). The EH6/7 center (E-c-1.55 eV) is the dominant midgap level as observed in DLTS spectra for n-type epilayers. The activation energy of EH6/7 center is unchanged regardless of applied electric field, indicating that the charge state of the EH6/7 center may be neutral after electron emission [acceptor-like (0/-) trap]. In p-type epilayers, a deep level located at 1.49 eV above the valence band edge has been detected. The lack of Poole-Frenkel effect in emission time constant from this deep level suggests that this level is donor-like (+/0). From the energy level and charge state, this defect center may originate from a single carbon vacancy (V-C), which has been extensively studied by electron paramagnetic resonance. (C) 2005 American Institute of Physics.
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页码:1 / 3
页数:3
相关论文
共 16 条
[1]
Dalibor T, 1997, PHYS STATUS SOLIDI A, V162, P199, DOI 10.1002/1521-396X(199707)162:1<199::AID-PSSA199>3.0.CO
[2]
2-0
[3]
Growth and characterization of 4H-SiC in vertical hot-wall chemical vapor deposition [J].
Fujihira, K ;
Kimoto, T ;
Matsunami, H .
JOURNAL OF CRYSTAL GROWTH, 2003, 255 (1-2) :136-144
[4]
3-DIMENSIONAL POOLE-FRENKEL EFFECT [J].
HARTKE, JL .
JOURNAL OF APPLIED PHYSICS, 1968, 39 (10) :4871-&
[5]
Deep level defects in electron-irradiated 4H SiC epitaxial layers [J].
Hemmingsson, C ;
Son, NT ;
Kordina, O ;
Bergman, JP ;
Janzen, E ;
Lindstrom, JL ;
Savage, S ;
Nordell, N .
JOURNAL OF APPLIED PHYSICS, 1997, 81 (09) :6155-6159
[6]
Negative-U centers in 4H silicon carbide [J].
Hemmingsson, CG ;
Son, NT ;
Ellison, A ;
Zhang, J ;
Janzen, E .
PHYSICAL REVIEW B, 1998, 58 (16) :10119-10122
[7]
Effects of C/Si ratio in chemical vapor deposition of 4H-SiC(11(2)over-bar0) and (03(3)over-bar8) [J].
Kimoto, T ;
Hashimoto, K ;
Matsunami, H .
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS, 2003, 42 (12) :7294-7295
[8]
High-power SiC diodes: Characteristics, reliability and relation to material defects [J].
Lendenmann, H ;
Dahlquist, F ;
Bergman, JP ;
Bleichner, H ;
Hallin, C .
SILICON CARBIDE AND RELATED MATERIALS 2001, PTS 1 AND 2, PROCEEDINGS, 2002, 389-3 :1259-1264
[9]
MADAR R, 2004, SILICON CARBIDE RE 2
[10]
Stability of deep centers in 4H-SiC epitaxial layers during thermal annealing [J].
Negoro, Y ;
Kimoto, T ;
Matsunami, H .
APPLIED PHYSICS LETTERS, 2004, 85 (10) :1716-1718