Local structure analysis of an optically active center in Er-doped ZnO thin film

被引:125
作者
Ishii, M
Komuro, S
Morikawa, T
Aoyagi, Y
机构
[1] JASRI, Mikaduki, Hyogo 6795198, Japan
[2] Toyo Univ, Fac Engn, Kawagoe, Saitama 3508585, Japan
[3] RIKEN, Inst Phys & Chem Res, Wako, Saitama 3510198, Japan
关键词
D O I
10.1063/1.1355284
中图分类号
O59 [应用物理学];
学科分类号
摘要
The local structure of an optically active center in erbium-doped zinc oxide (ZnO:Er) thin film produced by a laser ablation technique and its optical activation process are investigated by Er LIII-edge x-ray absorption fine structure analysis using a synchrotron radiation as an x-ray source. In as-ablated ZnO:Er thin film, Er has an approximately five-fold coordination of O surrounded by eight other O atoms as second-nearest neighbors. The high-order coordination of O decreases the Er-related photoluminescence (PL) intensity due to an undesirable crystal field for 4f radiation transition. After annealing in O-2 ambient, the local structure of Er changes to a pseudo-octahedral structure with C-4v symmetry, similar to the optically activated Er-doped Si (Si:Er), resulting in strong PL. The bond lengths of Er-O are evaluated, and differences in the optical activation processes between ZnO:Er and Si:Er thin films are discussed. (C) 2001 American Institute of Physics.
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页码:3679 / 3684
页数:6
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