Theoretical analysis of numerical aperture increasing lens microscopy -: art. no. 053105

被引:82
作者
Ippolito, SB
Goldberg, BB
Unlü, MS
机构
[1] Boston Univ, Dept Phys, Boston, MA 02215 USA
[2] Boston Univ, Dept Elect & Comp Engn, Boston, MA 02215 USA
[3] Boston Univ, Photon Ctr, Boston, MA 02215 USA
基金
美国国家科学基金会;
关键词
D O I
10.1063/1.1858060
中图分类号
O59 [应用物理学];
学科分类号
摘要
We present a detailed theoretical analysis and experimental results on a subsurface microscopy technique that significantly improves the light-gathering, resolving, and magnifying power of a conventional optical microscope. The numerical aperture increasing lens (NAIL) is a plano-convex lens placed on the planar surface of an object to enhance the amount of light coupled from subsurface structures within the object. In particular, a NAIL allows for the collection of otherwise inaccessible light at angles beyond the critical angle of the planar surface of the object. Therefore, the limit on numerical aperture increases from unity for conventional subsurface microscopy to the refractive index of the object for NAIL microscopy. Spherical aberration associated with conventional subsurface microscopy is also eliminated by the NAIL. Consequently, both the amount of light collected and diffraction-limited spatial resolution are improved beyond the limits of conventional subsurface microscopy. A theoretical optical model for imaging structures below the planar surface of an object, both with and without a NAIL, is presented. Experimental results demonstrating the predicted improvements in resolution of subsurface imaging are also presented. (C) 2005 American Institute of Physics.
引用
收藏
页数:12
相关论文
共 44 条
  • [1] Aberrations and allowances for errors in a hemisphere solid immersion lens for submicron-resolution photoluminescence microscopy
    Baba, M
    Sasaki, T
    Yoshita, M
    Akiyama, H
    [J]. JOURNAL OF APPLIED PHYSICS, 1999, 85 (09) : 6923 - 6925
  • [2] Immersion lens microscopy of photonic nanostructures and quantum dots
    Bennett, B
    Goldberg, S
    Ippolito, B
    Novotny, L
    Liu, ZH
    Ünlü, MS
    [J]. IEEE JOURNAL OF SELECTED TOPICS IN QUANTUM ELECTRONICS, 2002, 8 (05) : 1051 - 1059
  • [3] Born M., 1999, PRINCIPLES OPTICS, P465
  • [4] Near-field infrared imaging with a microfabricated solid immersion lens
    Fletcher, DA
    Crozier, KB
    Quate, CF
    Kino, GS
    Goodson, KE
    Simanovskii, D
    Palanker, DV
    [J]. APPLIED PHYSICS LETTERS, 2000, 77 (14) : 2109 - 2111
  • [5] Refraction contrast imaging with a scanning microlens
    Fletcher, DA
    Crozier, KB
    Quate, CF
    Kino, GS
    Goodson, KE
    Simanovskii, D
    Palanker, DV
    [J]. APPLIED PHYSICS LETTERS, 2001, 78 (23) : 3589 - 3591
  • [6] Focusing in microlenses close to a wavelength in diameter
    Fletcher, DA
    Goodson, KE
    Kino, GS
    [J]. OPTICS LETTERS, 2001, 26 (07) : 399 - 401
  • [7] Near-field photolithography with a solid immersion lens
    Ghislain, LP
    Elings, VB
    Crozier, KB
    Manalis, SR
    Minne, SC
    Wilder, K
    Kino, GS
    Quate, CF
    [J]. APPLIED PHYSICS LETTERS, 1999, 74 (04) : 501 - 503
  • [8] High-density optical recording using a solid immersion lens
    Ichimura, I
    Hayashi, S
    Kino, GS
    [J]. APPLIED OPTICS, 1997, 36 (19): : 4339 - 4348
  • [9] A highly sensitive scanning far-infrared microscope with quantum Hall detectors
    Ikushima, K
    Sakuma, H
    Komiyama, S
    [J]. REVIEW OF SCIENTIFIC INSTRUMENTS, 2003, 74 (09) : 4209 - 4211
  • [10] IPPOLITO S, 2004, THESIS BOSTON U