The end of CMOS scaling

被引：325

作者：

Skotnicki, T ^{[1
]}

Hutchby, JA

King, TJ

Wong, HSP

Boeuf, F

机构：

[1] ST Microelect, Crolles, France

[2] Semicond Res Corp, Durham, NC USA

[3] Univ Calif Berkeley, Berkeley, CA 94720 USA

[4] Stanford Univ, Palo Alto, CA 94304 USA

来源：

IEEE CIRCUITS & DEVICES | 2005年 / 21卷 / 01期

关键词：

D O I：

10.1109/MCD.2005.1388765

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 [电气工程]; 0809 [电子科学与技术];

摘要：

引用

页码：16 / 26

页数：11

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