Effects of ammonia flow at growth temperature ramping process on optical properties of InGaN/GaN multiple quantum wells

被引:11
作者
Han, YJ [1 ]
Chen, H [1 ]
Yu, HB [1 ]
Li, DS [1 ]
Yan, ZB [1 ]
Huang, Q [1 ]
Zhou, JM [1 ]
机构
[1] Chinese Acad Sci, Inst Phys, Beijing 100080, Peoples R China
关键词
metalorganic chemical vapor deposition; nitrides;
D O I
10.1016/S0022-0248(03)01109-6
中图分类号
O7 [晶体学];
学科分类号
0702 ; 070205 ; 0703 ; 080501 ;
摘要
Different ammonia flow rates were used during temperature ramping up to 1050degreesC after InGaN/GaN multiple quantum wells (MQWs) were grown at 820degreesC. Temperature-dependent photoluminescence (PL) as well as time-resolved PL (TRPL) spectra were measured and higher optical efficiency was obtained when higher ammonia flow rates were used. The effects of ammonia flow on the optical properties of InGaN/GaN multiple quantum wells were attributed to different indium content redistribution. At lower ammonia flow, In-rich regions became more uniform while the number of the In-rich regions decreased as a result of the disappearance of some In-rich regions with less In-rich regions. We ascribed enhancement of desorption of indium atoms to the lower ammonia flow. (C) 2003 Elsevier Science B.V. All rights reserved.
引用
收藏
页码:203 / 207
页数:5
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