Gas chromatographic analysis of trace gas impurities in tungsten hexafluoride

被引:25
作者
Laurens, JB
de Coning, JP
Swinley, JM
机构
[1] Univ Pretoria, Dept Chem Pathol, ZA-0001 Pretoria, South Africa
[2] S African Nucl Energy Corp, Pretoria, South Africa
[3] Sci Grp Pty Ltd, Johannesburg, South Africa
关键词
pulsed discharge helium ionisation detection; detection; GC; gases; tungsten hexafluoride; oxygen; nitrogen; carbon monoxide; carbon dioxide; sulfur hexafluoride;
D O I
10.1016/S0021-9673(00)01253-X
中图分类号
Q5 [生物化学];
学科分类号
071010 ; 081704 ;
摘要
Highly reactive fluorinated gaseous matrices require special equipment and techniques for the gas chromatographic analysis of trace impurities in these gases. The impurities that were analysed at the low-mug/l levels included oxygen, nitrogen, carbon dioxide, carbon monoxide, sulfur hexafluoride and hydrogen. This paper describes the use of a system utilising backflush column switching to protect the columns and detectors in the analysis of trace gas impurities in tungsten hexafluoride. Two separate channels were used for the analysis of H-2, O-2, N-2, CO, CO2 and SF6 impurities with pulsed discharge helium ionisation detection. (C) 2001 Elsevier Science B.V. All rights reserved.
引用
收藏
页码:107 / 112
页数:6
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