Fabrication of large area nanostructured magnets by interferometric lithography

被引：61

作者：

Farhoud, M ^{[1
]}

Hwang, M

Smith, HI

Schattenburg, ML

Bae, JM

Youcef-Toumi, K

Ross, CA

机构：

[1] MIT, Dept Elect Engn & Comp Sci, Cambridge, MA 02139 USA

[2] MIT, Dept Mat Sci & Engn, Cambridge, MA 02139 USA

[3] MIT, Dept Mech Engn, Cambridge, MA 02139 USA

[4] MIT, Space Res Ctr, Cambridge, MA 02139 USA

来源：

IEEE TRANSACTIONS ON MAGNETICS | 1998年 / 34卷 / 04期

关键词：

electrodeposition; interferometric lithography; patterned media; nanomagnet;

D O I：

10.1109/20.706365

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

Patterned arrays of magnetic elements maybe useful as media for high density magnetic storage applications. Interferometric lithography has been used to fabricate arrays of cobalt and nickel pillars with periods of 200 nm over areas of 5 cm x 5 cm using a UV laser. This provides an economical and rapid method for manufacturing particle arrays.

引用

页码：1087 / 1089

页数：3

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