Lateral wet oxidation of AlxGa1-xAs-GaAs depending on its structures

被引:44
作者
Kim, JH [1 ]
Lim, DH [1 ]
Kim, KS [1 ]
Yang, GM [1 ]
Lim, KY [1 ]
Lee, HJ [1 ]
机构
[1] JEONBUK NATL UNIV,SEMICOND PHYS RES CTR,JEONJU 561756,SOUTH KOREA
关键词
D O I
10.1063/1.117305
中图分类号
O59 [应用物理学];
学科分类号
摘要
Data are presented demonstrating that the lateral wet oxidation of Al(Ga)As layer is strongly influenced by its thicknesses and heterointerface structures as well as Al compositions. The oxidation length decreases rapidly with decreasing AlAs thickness in the range of <80 nm and oxidation nearly stops at a thickness of similar to 11 nm. Also, the oxidation rate of AlxGa1-xAs decreases quickly with decreasing Al composition, providing a high degree of oxidation selectivity. AlGaAs layers on bath sides of AlAs layer reduce the lateral oxidation rate which is enhanced by the stress induced by oxidized AlAs. (C) 1996 American Institute of Physics.
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页码:3357 / 3359
页数:3
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