Zone-doubling technique to produce ultrahigh-resolution x-ray optics

被引：132

作者：

Jefimovs, K. ^{[1
,2
]}

Vila-Comamala, J. ^{[3
]}

Pilvi, T. ^{[4
]}

Raabe, J. ^{[1
]}

Ritala, M. ^{[4
]}

David, C. ^{[1
]}

机构：

[1] Paul Scherrer Inst, CH-5232 Villigen, Switzerland

[2] EMPA, CH-8600 Dubendorf, Switzerland

[3] Lab Llum Sincrotro, E-08193 Barcelona, Spain

[4] Univ Helsinki, Lab Inorgan Chem, FI-00014 Helsinki, Finland

来源：

PHYSICAL REVIEW LETTERS | 2007年 / 99卷 / 26期

关键词：

D O I：

10.1103/PhysRevLett.99.264801

中图分类号：

O4 [物理学];

学科分类号：

0702 ;

摘要：

A method for the fabrication of ultrahigh-resolution Fresnel zone plate lenses for x-ray microscopy is demonstrated. It is based on the deposition of a zone plate material (Ir) onto the sidewalls of a prepatterned template structure (Si) using an atomic layer deposition technique. This results in a doubling of the effective zone density, thus improving the achievable resolution of x-ray microscopes. Test structures with lines and spaces down to 15 nm were resolved in a scanning transmission x-ray microscope at 1 keV photon energy.

引用

页数：4

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