Ultrathin TiB2 protective films

被引：11

作者：

Huang, F ^{[1
]}

Barnard, JA ^{[1
]}

Weaver, ML ^{[1
]}

机构：

[1] Univ Alabama, Dept Met & Mat Engn, Tuscaloosa, AL 35478 USA

来源：

JOURNAL OF MATERIALS RESEARCH | 2001年 / 16卷 / 04期

基金：

美国国家科学基金会;

关键词：

D O I：

10.1557/JMR.2001.0134

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

TiB2 thin films demonstrate considerable potential for use as protective overcoats in the magnetic recording industry due to their excellent mechanical and tribological properties and good chemical and thermal stability. In the many studies performed on TiB2 films, the relative effectiveness of ultrathin TiB2 films has not been systematically investigated for very thin TiB2 films. In the present investigation, film stress and microstructure in as-sputtered and annealed ultrathin TiB2 films were investigated as a function of thickness. Ultrathin TiB2 films, as thin as 5 nm, were observed to adequately protect an underlying magnetic layer from oxidation up to 400 degreesC.

引用

页码：945 / 954

页数：10

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