Isolated double quantum dot capacitively coupled to a single quantum dot single-electron transistor in silicon

被引:28
作者
Emiroglu, EG [1 ]
Hasko, DG
Williams, DA
机构
[1] Univ Cambridge, Cavendish Lab, Microelect Res Ctr, Madingley Rd, Cambridge CB3 0HE, England
[2] Hitachi Europe Ltd, Cavendish Lab, Hitachi Cambridge Lab, Cambridge CB3 0HE, England
关键词
D O I
10.1063/1.1626017
中图分类号
O59 [应用物理学];
学科分类号
摘要
We report electron transport measurements on a single-island single-electron transistor capacitively coupled to an isolated double quantum dot at 4.2 K. The structure is fabricated through trench isolation in silicon-on-insulator. We detect single-electron polarization of the isolated double quantum dot using the single-electron transistor as a sensitive electrometer, and estimate its charging energy. We observe a large suppression of current and modulation of Coulomb blockade peak heights as a function of applied gate voltages. (C) 2003 American Institute of Physics.
引用
收藏
页码:3942 / 3944
页数:3
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