Single-electron parametron memory cell

被引:4
作者
Emiroglu, EG
Durrani, ZAK
Hasko, DG
Williams, DA
机构
[1] Univ Cambridge, Cavendish Lab, Microelect Res Ctr, Cambridge CB3 0HE, England
[2] Hitachi Europe Ltd, Cavendish Lab, Hitachi Cambridge Lab, Cambridge CB3 0HE, England
来源
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 2002年 / 20卷 / 06期
关键词
D O I
10.1116/1.1524975
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
A single-electron parametron memory cell, based on two conducting islands separated by a multiple tunnel junction, has been realized in highly doped silicon-on-insulator. A memory cell with integrated read-out electrometers was fabricated using a combination of high-resolution electron beam lithography and reactive ion etching. The layout and operation of the memory cell is based on a proposal by Korotkov and Likharev, but modified in order to simplify fabrication. The operation of the electrometer, and the cell polarization characteristics are investigated by low temperature electrical measurements. Memory operation is indicated by current hysteresis in the electrometer characteristics with appropriate gate bias voltages. (C) 2002 American Vacuum Society.
引用
收藏
页码:2806 / 2809
页数:4
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