The characteristics of some metallic oxides prepared in high vacuum by ion beam sputtering

被引：34

作者：

Lee, CC ^{[1
]}

Hsu, JC ^{[1
]}

Wong, DH ^{[1
]}

机构：

[1] Natl Cent Univ, Inst Opt Sci, Chungli 320, Taiwan

来源：

APPLIED SURFACE SCIENCE | 2001年 / 171卷 / 1-2期

关键词：

ion beam sputtering; surface morphology; optical constants; post-baking;

D O I：

10.1016/S0169-4332(00)00556-0

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

The characteristics of ion beam sputtered metallic oxides deposited in high vacuum are analyzed by X-ray diffractometer. atomic force microscopy, spectrophotometer and ellipsometer. The metallic oxide thin films include aluminum oxide, niobium oxide, silicon oxide, tantalum oxide, zirconium oxide, and titanium oxide. The structure, surface morphology and optical constant are described. An oxide film with low surface roughness, low extinction coefficient and high packing density is crucial for an optical application. We found that to make such a high quality film there is an optimum deposition condition and an optimum post-baking temperature. Moreover, the optimum deposition condition and the optimum post-baking temperature are different for different metallic oxides. (C) 2001 Elsevier Science B.V. All rights reserved.

引用

页码：151 / 156

页数：6

共 12 条

[1]

[Anonymous], [No title captured]

[2] THE USE OF ION-BEAM SPUTTERED OPTICAL COATINGS AS PROTECTIVE OVERCOATS [J].