Atomic Layer Deposition of Ta-doped TiO2 Electrodes for Dye-Sensitized Solar Cells

被引:40
作者
Choi, Ji-Hwan [1 ]
Kwon, Se-Hun [1 ]
Jeong, Young-Keun [1 ]
Kim, Il [3 ]
Kim, Kwang-Ho [1 ,2 ]
机构
[1] Pusan Natl Univ, Natl Core Res Ctr Hybrid Mat Solut, Pusan 609735, South Korea
[2] Pusan Natl Univ, Sch Mat Sci & Engn, Pusan 609735, South Korea
[3] Pusan Natl Univ, Dept Polymer Sci & Engn, Pusan 609735, South Korea
基金
新加坡国家研究基金会;
关键词
IMPROVED-PERFORMANCE; RECOMBINATION; EFFICIENCY; SHELL; DSSC; FILM;
D O I
10.1149/1.3582765
中图分类号
O646 [电化学、电解、磁化学];
学科分类号
081704 ;
摘要
Ta-doped TiO2 inverse opals were obtained by selective etching of a silica template after atomic layer deposition (ALD) of Ta-doped TiO2 films and were applied as an electrode for dye-sensitized solar cells (DSSCs). Ta content in the Ta-doped TiO2 film was controlled by the Ta/(Ta+Ti) unitcycle ratios in the Ta-TiO2 supercycle of ALD. Also, excellent step coverage of nearly 100% in the inverse opal structure was confirmed by field-emission scanning electron microscopy (FE-SEM). Maximum photo-conversion efficiency of 1.56% was achieved with the Ta (3.4 atom %)-doped TiO2 inverse opal electrode due to increased photocurrent density. However, further Ta doping (> 4.9 atom %) decreased the J(sc) and photoconversion efficiency. (C) 2011 The Electrochemical Society. [DOI: 10.1149/1.3582765] All rights reserved.
引用
收藏
页码:B749 / B753
页数:5
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