Self-assembled Fe nanowires using organometallic chemical vapor deposition and CaF2 masks on stepped Si(111)

被引：61

作者：

Lin, JL

Petrovykh, DY

Kirakosian, A

Rauscher, H

Himpsel, FJ

Dowben, PA

机构：

[1] Univ Wisconsin, Dept Phys, Madison, WI 53706 USA

[2] Univ Nebraska, Dept Phys & Astron, Lincoln, NE 68588 USA

来源：

APPLIED PHYSICS LETTERS | 2001年 / 78卷 / 06期

关键词：

D O I：

10.1063/1.1345830

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

Linear arrays of 3 nm wide Fe stripes with 15 nm spacing are fabricated by self-assembly. They are formed by photolysis of ferrocene that is selectively adsorbed between CaF2 stripes. An ultraviolet nitrogen laser removes the organic ligands from ferrocene. Arrays of CaF2 stripes serve as masks, which are self-assembled on a stepped Si(111) surface. Scanning tunneling microscopy is used to investigate the surface morphology during growth. A generalization of this method to other wire materials is discussed. (C) 2001 American Institute of Physics.

引用

页码：829 / 831

页数：3

共 14 条

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