Electron field emission from sulfur-incorporated nanocrystalline carbon thin films

被引:20
作者
Gupta, S
Weiss, BL
Weiner, BR
Morell, G
机构
[1] Univ Puerto Rico, Dept Phys, San Juan, PR 00931 USA
[2] Univ Puerto Rico, Dept Chem, San Juan, PR 00931 USA
[3] Univ Puerto Rico, Dept Phys Sci, San Juan, PR 00931 USA
关键词
D O I
10.1063/1.1411988
中图分类号
O59 [应用物理学];
学科分类号
摘要
Results are reported on the electron field emission properties of sulfur-incorporated nanocrystalline carbon (n-C:S) thin films grown by hot-filament chemical vapor deposition technique. The lowest turn-on field values observed were around 4.0-4.5 V/mum, which are about half of those measured for films grown without sulfur. Associated to the effect of addition of sulfur on field emission properties, there are interesting microstructural changes, as characterized with scanning electron microscopy, atomic force microscopy, and Raman spectroscopy techniques. The sulfur-incorporated films show smoother and finer-grained surfaces than those grown without sulfur. These results are similar to those found for the introduction of nitrogen, but different to those produced by oxygen addition to the chemical vapor deposition process. These findings are attributed to changes in the electronic band structure. (C) 2001 American Institute of Physics.
引用
收藏
页码:3446 / 3448
页数:3
相关论文
共 29 条
[1]  
Amaratunga GAJ, 1996, APPL PHYS LETT, V68, P2529, DOI 10.1063/1.116173
[2]   Nitrogen doping of tetrahedral amorphous carbon films: Scanning tunneling spectroscopy [J].
Bhattacharyya, S ;
Walzer, K ;
Hietschold, M ;
Richter, F .
JOURNAL OF APPLIED PHYSICS, 2001, 89 (03) :1619-1624
[3]  
Castellano J.A., 1992, HDB DISPLAY TECHNOLO
[4]  
Coll BF, 1998, MATER RES SOC SYMP P, V498, P185
[5]   Interpretation of Raman spectra of disordered and amorphous carbon [J].
Ferrari, AC ;
Robertson, J .
PHYSICAL REVIEW B, 2000, 61 (20) :14095-14107
[6]  
GAMO MN, 2001, THIN SOLID FILMS, V382, P113
[7]   DIAMOND COLD-CATHODE [J].
GEIS, MW ;
EFREMOW, NN ;
WOODHOUSE, JD ;
MCALEESE, MD ;
MARCHYWKA, M ;
SOCKER, DG ;
HOCHEDEZ, JF .
IEEE ELECTRON DEVICE LETTERS, 1991, 12 (08) :456-459
[8]   Field emission properties of nanocrystalline chemically vapor deposited-diamond films [J].
Gröning, O ;
Küttel, OM ;
Gröning, P ;
Schlapbach, L .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1999, 17 (05) :1970-1986
[9]   Spectroscopic ellipsometry studies of nanocrystalline carbon thin films deposited by HFCVD [J].
Gupta, S ;
Weiner, BR ;
Morell, G .
DIAMOND AND RELATED MATERIALS, 2001, 10 (11) :1968-1972
[10]   Study of the electron field emission and microstructure correlation in nanocrystalline carbon thin films [J].
Gupta, S ;
Weiss, BL ;
Weiner, BR ;
Morell, G .
JOURNAL OF APPLIED PHYSICS, 2001, 89 (10) :5671-5675