Growth of heteroepitaxial ZnO thin films by femtosecond pulsed-laser deposition

被引:76
作者
Millon, E
Albert, O [1 ]
Loulergue, JC
Etchepare, J
Hulin, D
Seiler, W
Perrière, J
机构
[1] Ecole Polytech, ENSTA, LOA, CNRS,UMR 7639, F-91761 Palaiseau, France
[2] Univ Metz, LSMCL, F-57078 Metz 3, France
[3] Univ Metz, LMOPS, F-57078 Metz 3, France
[4] Supelec, F-57078 Metz 3, France
[5] ENSAM, CNRS, ESA 8006, F-75013 Paris, France
[6] Univ Paris 06, GPS, CNRS, UMR 7588, F-75251 Paris 5, France
[7] Univ Paris 07, GPS, CNRS, UMR 7588, F-75251 Paris 5, France
关键词
D O I
10.1063/1.1324679
中图分类号
O59 [应用物理学];
学科分类号
摘要
ZnO thin films have been grown on various substrates by femtosecond pulsed-laser deposition. According to optical microscopy and atomic force microscopy analyses, the production of droplets is not significant using femtosecond pulses. Smooth, dense, stoichiometric, crystalline, and textured hexagonal ZnO films are epitaxially grown on (0001) sapphire at 700 degreesC with an in-plane epitaxial relationship corresponding to a 30 degrees rotation of the ZnO basal plane with respect to the sapphire. Nevertheless, channeling experiments and rocking curve measurements show that the crystalline quality is not as good as that obtained with nanosecond pulses. (C) 2000 American Institute of Physics. [S0021-8979(00)06624-X].
引用
收藏
页码:6937 / 6939
页数:3
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