Fabrication and characterization of bilayer metal wire-grid polarizer using nanoimprint lithography on flexible plastic substrate

被引:42
作者
Meng, Fantao [2 ]
Luo, Gang [2 ]
Maximov, Ivan [2 ]
Montelius, Lars [2 ]
Chu, Jinkui [1 ]
Xu, Hongqi [2 ]
机构
[1] Dalian Univ Technol, Sch Mech Engn, Key Lab Micro Nano Technol & Syst Liaoning Prov, Dalian 116024, Peoples R China
[2] Lund Univ, Div Solid State Phys, S-22100 Lund, Sweden
关键词
Bilayer wire-grid polarizer; Nanoimprint lithography; Flexible plastic substrate; TM transmission; Extinction ratio; GRATINGS;
D O I
10.1016/j.mee.2011.06.008
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
In this work, we demonstrate the fabrication of bilayer metal wire-grid polarizers and the characterization of their performance. The polarizers with 200 nm period were fabricated on flexible plastic substrates by nanoimprint lithography (NIL), followed by aluminum deposition. Transmission efficiency over 0.51 and extinction ratio higher than 950 can be achieved in the visible range when the aluminum thickness of the polarizer is 100 nm. The fabrication process only involves direct imprinting on flexible plastic substrates and aluminum deposition, without any resist spin-coating, lift-off, and etching processes, which is much simpler, less costly, and applicable to large volume production. (C) 2011 Elsevier B.V. All rights reserved.
引用
收藏
页码:3108 / 3112
页数:5
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