New III-V semiconductor lasers emitting near 2.6 mu m

被引:12
作者
Baranov, AN [1 ]
Sherstnev, VV [1 ]
Alibert, C [1 ]
机构
[1] UNIV LANCASTER,SCH PHYS & CHEM,ADV MAT DIV,LANCASTER LA1 4YB,ENGLAND
关键词
D O I
10.1063/1.361240
中图分类号
O59 [应用物理学];
学科分类号
摘要
Lasing has been obtained near 2.6 mu m in double-heterostructure InGaAs/InAlAs diode lasers grown by metalorganic vapor phase epitaxy on InAs substrates. At 80 K threshold currents are in the range of 40-200 mA for lasers of deep mesa geometry. The characteristic temperature of the temperature dependence of the threshold current T-0 is 21-23 K and lasing was achieved up to 150 K in a pulsed regime. A blueshift of up to 3.0 nm with increasing current is observed. A blueshift is also observed with increasing temperature, which is attributed to refractive index change due to the strong temperature dependence of the threshold carrier density in narrow gap III-V semiconductor lasers. (C) 1996 American Institute of Physics.
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收藏
页码:3354 / 3356
页数:3
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