The effect of Ti ion bombardment on the interfacial structure between TiN and iron nitride
被引:15
作者:
Baek, WS
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机构:
Korea Inst Machinery & Mat, Thin Films Proc Lab, Kyungnam 641010, South KoreaKorea Inst Machinery & Mat, Thin Films Proc Lab, Kyungnam 641010, South Korea
Baek, WS
[1
]
Kwon, SC
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机构:Korea Inst Machinery & Mat, Thin Films Proc Lab, Kyungnam 641010, South Korea
Kwon, SC
Lee, JY
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机构:Korea Inst Machinery & Mat, Thin Films Proc Lab, Kyungnam 641010, South Korea
Lee, JY
Lee, SR
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机构:Korea Inst Machinery & Mat, Thin Films Proc Lab, Kyungnam 641010, South Korea
Lee, SR
Rha, JJ
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机构:Korea Inst Machinery & Mat, Thin Films Proc Lab, Kyungnam 641010, South Korea
Rha, JJ
Nam, KS
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机构:Korea Inst Machinery & Mat, Thin Films Proc Lab, Kyungnam 641010, South Korea
Nam, KS
机构:
[1] Korea Inst Machinery & Mat, Thin Films Proc Lab, Kyungnam 641010, South Korea
[2] Korea Adv Inst Sci & Technol, Dept Mat Sci & Engn, Taejon 305701, South Korea
duplex treatment;
black layer;
interface;
adhesion;
D O I:
10.1016/S0040-6090(98)00368-X
中图分类号:
T [工业技术];
学科分类号:
08 ;
摘要:
In order to investigate the interfacial structure between TiN and iron nitride, an AISI 4140 steel was nitrided to form a layer of thickness 15 mu m by DC ion nitriding, then the surface was bombarded with Ti ions and subsequently coated a TiN film of 5 mu m by are ion plating method. The interfacial microstructure between TiN and iron nitride was characterized by optical microscope, SEM and XRD. The so-called 'black' layer was observed in the duplex treatment. It resulted from the decomposition of iron nitride during the bombardment. Its thickness was increased with increasing bombardment time at high bias voltage. But the thickness was greatly decreased when the iron nitride was bombarded with a nitrogen gas or at a reduced bias voltage. The adhesion strength of the top TiN coating was decreased with increasing thickness of the black layer. Furthermore, the reduced adhesion strength in this system was discussed in view of the interfacial structural relationship between TiN and iron nitride. (C) 1998 Elsevier Science S.A. All rights reserved.