XPS investigations of chromium nitride thin films

被引：201

作者：

Lippitz, A ^{[1
]}

Hübert, T ^{[1
]}

机构：

[1] BAM, D-12203 Berlin, Germany

来源：

SURFACE & COATINGS TECHNOLOGY | 2005年 / 200卷 / 1-4期

关键词：

XPS; ESCA; physical vapour deposition (PVD); CrN thin films; HIGH-TEMPERATURE OXIDATION; THERMAL-STABILITY; HARD COATINGS; CRN; BEHAVIOR; TIN;

D O I：

10.1016/j.surfcoat.2005.02.091

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

Cr-N film coatings were prepared by magnetron sputter deposition at different nitrogen partial pressures. The film characterisation by XRD and DTG gives average bulk compositions of Cr2N and CrN for the coatings. Highly sensitive XPS investigations were performed and the chemical and phase compositions of a film surface range of about 10 nm thickness was estimated quantitatively from the deconvoluted peak intensities. It is demonstrated that the composition of the surface of chromium nitride thin films differs from the core and is more complex in constitution. Not only chromium nitrides (Cr2N and CrN) but also chromium oxynitrides and chromium oxides (CrOx and CrOxHy) were detected. Metallic chromium was also found in films prepared at higher nitrogen flow. The concentration of the estimated phases shows dependence on film preparation and additional heat treatment. (c) 2005 Elsevier B.V. All rights reserved.

引用

页码：250 / 253

页数：4

共 26 条

[1]

ALLEN GC, 1973, J CHEM SOC DALTON, P1675

[2] Deposition, properties and applications of PVD CrxN coatings [J].