Kinetics of Au-containing ternary intermetallic redeposition at solder/UBM interface

被引:21
作者
Lee, JH [1 ]
Park, JH
Shin, DH
Lee, YH
Kim, YS
机构
[1] Hongik Univ, Dept Met & Mat Sci, Seoul, South Korea
[2] Hanyang Univ, Dept Met & Mat Sci, Ansan, South Korea
关键词
Au-embrittlement; aging treatment; Au-containing ternary intermetallic; redeposition; fracture energy;
D O I
10.1007/s11664-001-0141-9
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
In this study, the effects of the under bump metallurgy (UBM) structure and Cu content in solders on the redeposition rate of Au-containing ternary intermetallics at the solder/UBM interface were investigated. A UBM structure with a Ni diffusion barrier, Au/Ni/Cu, appeared to promote the redeposition of ternary Au-containing intermetallics at the solder/UBM interface of the ternary during the solid-state aging treatment and the Au-embrittlement of the solder interconnections. Copper added to the eutectic Sn-Pb and Sn-Ag solders was observed to be very effective in retarding the redeposition by forming the ternary intermetallics in solder matrices and preventing the Au-embrittlement. These phenomena were discussed with the microstructures observed.
引用
收藏
页码:1138 / 1144
页数:7
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