Microscopic mechanisms of radiation-induced proton density decay in SiO2 films

被引:14
作者
Karna, SP
Pugh, RD
Chavez, JR
Shedd, W
Brothers, CP
Singaraju, BK
Vitiello, M
Pacchioni, G
Devine, RA
机构
[1] USAF, Res Lab, Kirtland AFB, NM 87117 USA
[2] Univ Milan, Dipartimento Sci Mat, I-20126 Milan, Italy
[3] France Telecom, Ctr Natl Etud Telecommun, F-38243 Meylan, France
关键词
D O I
10.1109/23.736479
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
In order to understand the physics of radiation-induced proton density decay in thin SiO2 films, we performed ab initio Hartree-Fock calculations of the potential energy curves for the interaction between model oxide clusters and H in two charge states. The calculated results led to two separate proposed mechanisms for proton density decay in thin SiO2 films: (1) electronic excitation involving hot phonon levels of the ground electronic state at low photon-energy radiation and (2) electron capture by protons at high photon-energy radiation. The proposed mechanisms qualitatively explain recent experimental observations.
引用
收藏
页码:2408 / 2412
页数:5
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