Processing nanostructured materials: the need to integrate experimental data with multiscale continuum/non-continuum simulations

被引:13
作者
Alkire, R [1 ]
机构
[1] Univ Illinois, Dept Chem & Biomol Engn, Natl Computat Sci Alliance, Urbana, IL 61801 USA
关键词
additives; electrodeposition; film growth; IR drop; morphology; simulation;
D O I
10.1016/S0022-0728(02)01452-3
中图分类号
O65 [分析化学];
学科分类号
070302 [分析化学]; 081704 [应用化学];
摘要
The purpose of this presentation is to provide a selective overview of science and engineering aspects of morphology evolution, and to suggest areas where strategic advances will benefit a broad range of specific technologies. Recent advances in experimental and computational approaches for both continuum and non-continuum regions of behavior are presented for the study of additive effects on copper morphology evolution during electrodeposition. In microelectronic applications, deposit quality is determined on the molecular scale by the action of additives. Emphasis is therefore placed on integration of experimental data and qualitative hypotheses with computational strategies in order to understand behavior at the non-continuum level. In addition, emphasis is also given to the linkage of non-continuum simulations with traditional electrochemical engineering tools that use continuum methods to compute potential and current distribution phenomena in macroscopic systems. The use of multiscale, multi-phenomena numerical simulation offers promise for speeding innovation as well as design of advanced technological applications. (C) 2003 Elsevier Science B.V. All rights reserved.
引用
收藏
页码:3 / 12
页数:10
相关论文
共 66 条
[1]
ALKIRE R, 1994, CHEM ENG SCI, V49, P4085
[2]
PREDICTING ELECTRODE SHAPE CHANGE WITH USE OF FINITE-ELEMENT METHODS [J].
ALKIRE, R ;
BERGH, T ;
SANI, RL .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1978, 125 (12) :1981-1988
[3]
The bridge from nanoscale phenomena to macroscopic processes [J].
Alkire, R ;
Verhoff, M .
ELECTROCHIMICA ACTA, 1998, 43 (19-20) :2733-2741
[4]
A THEORY FOR POROUS ELECTRODES UNDERGOING STRUCTURAL CHANGE BY ANODIC DISSOLUTION [J].
ALKIRE, RC ;
GRENS, EA ;
TOBIAS, CW .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1969, 116 (10) :1328-&
[5]
Damascene copper electroplating for chip interconnections [J].
Andricacos, PC ;
Uzoh, C ;
Dukovic, JO ;
Horkans, J ;
Deligianni, H .
IBM JOURNAL OF RESEARCH AND DEVELOPMENT, 1998, 42 (05) :567-574
[6]
ANDRICACOS PC, 1999, INTERFACE, V8, P32
[7]
Beck J.V., 1977, Parameter Estimation in Engineering and Science
[8]
Computer simulations of electrochemical systems [J].
Bopp, PA ;
Kohlmeyer, A ;
Spohr, E .
ELECTROCHIMICA ACTA, 1998, 43 (19-20) :2911-2918
[9]
Budevski E., 1996, ELECTROCHEMICAL PHAS
[10]
Choosing the right model: Case studies on the use of statistical model discrimination experiments [J].
Burke, AL ;
Duever, TA ;
Penlidis, A .
CANADIAN JOURNAL OF CHEMICAL ENGINEERING, 1997, 75 (02) :422-436