Analysis of GaAs properties under biaxial tensile stress

被引:12
作者
Kim, KS [1 ]
Yang, GM
Lee, HJ
机构
[1] Chonbuk Natl Univ, Dept Semicond Sci & Technol, Chonju 561756, South Korea
[2] Chonbuk Natl Univ, Semicond Phys Res Ctr, Chonju 561756, South Korea
来源
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1998年 / 16卷 / 04期
关键词
D O I
10.1116/1.581397
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
A tetragonally distorted GaAs layer was grown on a Si(100) substrate by metalorganic chemical vapor deposition. From both the splitting and the shift of band-edge exciton lines in photoluminescence, the GaAs epilayer is found to be under biaxial tensile stress, which is quantitatively investigated using optical measurements, namely, Raman and temperature-dependent photoluminescence spectroscopy. The biaxial tensile stresses deduced from the intrinsic excitonic lines vary with temperature. The origin of the stress variation with temperature is discussed in detail. From the photoluminescence intensity ratios between the heavy- and light-hole excitonic transitions, the actual temperature where the conduction to heavy-hole band transition begins to predominate is found to be above 70 K. (C) 1998 American Vacuum Society. [S0734-2101(98)06404-5].
引用
收藏
页码:2663 / 2667
页数:5
相关论文
共 23 条
[21]   STRAIN VARIATIONS IN HETEROEPITAXIAL INP-ON-SI GROWN BY LOW-PRESSURE METALORGANIC CHEMICAL VAPOR-DEPOSITION [J].
WUU, DS ;
HORNG, RH ;
LEE, MK .
APPLIED PHYSICS LETTERS, 1989, 54 (22) :2244-2246
[22]   CHARACTERIZATION OF GAAS FILMS GROWN ON VICINAL SI(110) SUBSTRATES BY MOLECULAR-BEAM EPITAXY [J].
YODO, T .
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1995, 34 (9A) :4631-4640
[23]   PHOTOLUMINESCENCE AND PHOTOLUMINESCENCE EXCITATION-SPECTRA OF GAAS GROWN DIRECTLY ON SI [J].
ZEMON, S ;
SHASTRY, SK ;
NORRIS, P ;
JAGANNATH, C ;
LAMBERT, G .
SOLID STATE COMMUNICATIONS, 1986, 58 (07) :457-460