Nano-domain engineering in LiNbO3 by focused ion beam

被引:27
作者
Li, XJ
Terabe, K
Hatano, H
Kitamura, K
机构
[1] Natl Inst Mat Sci, Tsukuba, Ibaraki 3050044, Japan
[2] Pioneer, Corp Res & Dev Labs, Tsurugashima, Saitama 3052288, Japan
来源
JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS | 2005年 / 44卷 / 50-52期
关键词
domain engineering; focused ion beam; LiNbO3;
D O I
10.1143/JJAP.44.L1550
中图分类号
O59 [应用物理学];
学科分类号
摘要
Domain tailored ferroelectric crystals are fascinating functional materials. This needs a simple and highly productive domain engineering method at the micro- and nano-scales. In this letter, penetrating dot domain of top and bottom diameters of 360 and 310 nm, respectively, in 100-mu m-thick stoichiometric LiNbO3 by focused ion beam domain engineering has been demonstrated. Surface structures of the same size can be fabricated by combining this focused ion beam domain engineering with HF-selective etching.
引用
收藏
页码:L1550 / L1552
页数:3
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