Effects of electroless plating chemistry on the synthesis of palladium membranes

被引:111
作者
Cheng, YS [1 ]
Yeung, KL [1 ]
机构
[1] Hong Kong Univ Sci & Technol, Dept Chem Engn, Kowloon, Hong Kong, Peoples R China
关键词
electroless plating chemistry; palladium membranes; hypophosphite-based plating bath; membrane preparation and structure; hydrazine-based plating bath;
D O I
10.1016/S0376-7388(00)00563-9
中图分类号
TQ [化学工业];
学科分类号
0817 ;
摘要
The effects of plating chemistry on palladium deposition, plating efficiency and membrane microstructure have been studied for two palladium electroless plating solutions, hydrazine-based and hypophosphite-based plating baths. The electroless plating kinetics of palladium onto seeded supports have been determined for hypophosphite-based plating bath, and a simple kinetic model has been developed. The model provides an accurate prediction of deposition rate and film thickness as a function of plating parameters. Most importantly, the experimental results demonstrated that plating chemistry plays a vital role on both plating performance and film microstructure. (C) 2001 Elsevier Science B.V. All rights reserved.
引用
收藏
页码:195 / 203
页数:9
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