Ballistic transport in a GaAs/AlxGa1-xAs one-dimensional channel fabricated using an atomic force microscope

被引:19
作者
Curson, NJ [1 ]
Nemutudi, R [1 ]
Appleyard, NJ [1 ]
Pepper, M [1 ]
Ritchie, DA [1 ]
Jones, GAC [1 ]
机构
[1] Univ Cambridge, Cavendish Lab, Cambridge CB3 0HE, England
关键词
D O I
10.1063/1.1374225
中图分类号
O59 [应用物理学];
学科分类号
摘要
We fabricate a one-dimensional constriction in a shallow, delta -doped GaAs/AlxGa1-xAs two-dimensional electron gas, by locally oxidizing the surface using an atomic force microscope. The channel exhibits ballistic conduction with up to seven conductance plateaus, quantized in units of 2e(2)/h. The dependence of the device conductance on dc bias voltage reveals the energy separation of the first two subbands to be DeltaE(1,2)=5.5(+/-0.3) meV, which allows ballistic conduction to be observed up to a temperature of 20 K. A lateral electric field, combined with the hard-walled confinement due to the insulating lines, allows manipulation of the electron wave function in a way which is not possible with surface-gated devices. (C) 2001 American Institute of Physics.
引用
收藏
页码:3466 / 3468
页数:3
相关论文
共 21 条
[1]   Atomic force microscope tip-induced local oxidation of silicon: Kinetics, mechanism, and nanofabrication [J].
Avouris, P ;
Hertel, T ;
Martel, R .
APPLIED PHYSICS LETTERS, 1997, 71 (02) :285-287
[2]   Patterning of silicon surfaces with noncontact atomic force microscopy:: Field-induced formation of nanometer-size water bridges [J].
García, R ;
Calleja, M ;
Rohrer, H .
JOURNAL OF APPLIED PHYSICS, 1999, 86 (04) :1898-1903
[3]   Mechanisms of surface anodization produced by scanning probe microscopes [J].
Gordon, AE ;
Fayfield, RT ;
Litfin, DD ;
Higman, TK .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1995, 13 (06) :2805-2808
[4]   Fabricating tunable semiconductor devices with an atomic force microscope [J].
Held, R ;
Lüscher, S ;
Heinzel, T ;
Ensslin, K ;
Wegscheider, W .
APPLIED PHYSICS LETTERS, 1999, 75 (08) :1134-1136
[5]   In-plane gates and nanostructures fabricated by direct oxidation of semiconductor heterostructures with an atomic force microscope [J].
Held, R ;
Vancura, T ;
Heinzel, T ;
Ensslin, K ;
Holland, M ;
Wegscheider, W .
APPLIED PHYSICS LETTERS, 1998, 73 (02) :262-264
[6]  
IISHII M, 1995, JPN J APPL PHYS PT 1, V34, P1329
[7]   Fabrication of a single-electron transistor by current-controlled local oxidation of a two-dimensional electron system [J].
Keyser, UF ;
Schumacher, HW ;
Zeitler, U ;
Haug, RJ ;
Eberl, K .
APPLIED PHYSICS LETTERS, 2000, 76 (04) :457-459
[8]   Conductance quantization above 30 K in GaAlAs shallow-etched quantum point contacts smoothly joined to the background 2DEG [J].
Kristensen, A ;
Jensen, JB ;
Zaffalon, M ;
Sorensen, CB ;
Reimann, SM ;
Lindelof, PE ;
Michel, M ;
Forchel, A .
JOURNAL OF APPLIED PHYSICS, 1998, 83 (01) :607-609
[9]  
Lüscher S, 1999, APPL PHYS LETT, V75, P2452, DOI 10.1063/1.125045
[10]   Room temperature operation of a single electron transistor made by the scanning tunneling microscope nanooxidation process for the TiOx/Ti system [J].
Matsumoto, K ;
Ishii, M ;
Segawa, K ;
Oka, Y ;
Vartanian, BJ ;
Harris, JS .
APPLIED PHYSICS LETTERS, 1996, 68 (01) :34-36