Surface states on n-type Al0.24Ga0.76As characterized by deep-level transient spectroscopy

被引:10
作者
Choi, KJ [1 ]
Lee, JL [1 ]
机构
[1] Pohang Univ Sci & Technol, Dept Mat Sci & Engn, POSTECH, Pohang 790784, Kyungbuk, South Korea
来源
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 2001年 / 19卷 / 03期
关键词
D O I
10.1116/1.1368679
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Surface states on n-type Al0.24Ga0.76As were studied using capacitance deep-level transient spectroscopy (DLTS). Two types of hole-like traps (labeled as H1 and H2 in this work) were observed in a Al0.24Ga0.76As/In(0.22)Ga(0.78)AS pseudomorphic high-electron-mobility transistor with a multifinger gate. But, no hole-like traps were observed in the fat field-effect transistor (FATFET) having a negligible ratio of the ungated surface to the total area between the source and the drain. This provides evidence that the hole-like trap peaks in the DLTS spectra originated from surface states at the ungated Al(0.24)Ga(0.76)AS regions exposed between gate and source/drain electrodes. The activation energies for both surface states were determined to be 0.50 +/-0.03 and 0.81 +/-0.01 eV. The comparison of activation energies of the two surface states with the Schottky barrier height 0.66 +/-0.01 eV suggests that H1 and H2 are deeply related to the Fermi energy pinning levels at the Al0.24Ga0.76As surface. (C) 2001 American Vacuum Society.
引用
收藏
页码:615 / 621
页数:7
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