Two silicon optical modulators realizable with a fully compatible bipolar process

被引:13
作者
Breglio, G [1 ]
Cutolo, A
Irace, A
Spirito, P
Zeni, L
Iodice, M
Sarro, PM
机构
[1] Univ Naples Federico II, Dipartimento Ingn Elettron, I-80125 Naples, Italy
[2] Ist Ric Elettromagnetismo & Componenti Elettron, I-80125 Naples, Italy
[3] DIMES, Elect Components Technol & Mat Grp, NL-2660 CD Delft, Netherlands
关键词
gratings; integrated optoelectronics; optical waveguides; optoelectronic devices;
D O I
10.1109/2944.736098
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
In this paper, we describe two different kinds of silicon optical modulators both integrated into a silicon on silicon optical channel waveguide which can be realized using a standard bipolar process. The possibility of using standard, well-known technology presents several advantages with respect to III-V optoelectronics. The first device presented is based on a three-terminal active device and exploits the plasma dispersion effect to achieve the desired modulation. The active device used is a bipolar mode field effect transistor; we show how the introduction of the third control terminal introduces some definite advantages with respect to commonly p-i-n driven modulators, The second is an electrically controlled Bragg reflector, In this case, although controlled by a p-i-n diode, fast switching speed is achieved because lower injection levels are required. Numerical simulations and preliminary experimental results are presented on both devices.
引用
收藏
页码:1003 / 1010
页数:8
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