Characterization of focused electron beam induced carbon deposits from organic precursors

被引:53
作者
Bret, T [1 ]
Mauron, S [1 ]
Utke, I [1 ]
Hoffmann, P [1 ]
机构
[1] Ecole Polytech Fed Lausanne, Sch Engn, Inst Imaging & Appl Opt, CH-1015 Lausanne, Switzerland
关键词
focused electron beam induced deposition; amorphous carbon; micro-FTIR; micro-Raman; micro- and nanostructures;
D O I
10.1016/j.mee.2005.01.006
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 [电气工程]; 0809 [电子科学与技术];
摘要
We have screened several organic precursors for focused electron beam induced deposition of carbon. The growth rates are found to be higher with the light carboxylic acid series than with styrene. The deposits obtained are analyzed by several micro-characterization methods. They have close compositions and structures, quite independently on the nature of the precursor. Besides C, the deposits contain only 0 and H. The compositions of the deposits are shown to be close to C9H2O1. The C fraction is amorphous carbon, more than 90% sp(2). Two electron-induced processes occur: electron-induced precursor fixation and desorption of volatile elements. (c) 2005 Elsevier B.V. All rights reserved.
引用
收藏
页码:300 / 306
页数:7
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