Model for intrinsic stress formation in amorphous thin films

被引：71

作者：

Mayr, SG ^{[1
]}

Samwer, K ^{[1
]}

机构：

[1] Inst Phys 1, D-37073 Gottingen, Germany

来源：

PHYSICAL REVIEW LETTERS | 2001年 / 87卷 / 03期

关键词：

D O I：

10.1103/PhysRevLett.87.036105

中图分类号：

O4 [物理学];

学科分类号：

0702 ;

摘要：

Metallic amorphous thin films evaporated on a substrate can be characterized by different growth regimes in dependence of the film thickness concerning surface morphology and intrinsic film stresses, independent of the details of the applied material systems. Here, a model is presented to link the surface topography and characteristic surface measures with the observed film stresses. This allows quantitative prediction of stresses in dependence of film preparation parameters for a tailored film production.

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页码：361051 / 361054

页数：4

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