Bending strength of borosilicate glass coated with alumina and silicon carbide by RF magnetron sputtering

被引:14
作者
Hoshide, T [1 ]
Nebu, A
Hayashi, K
机构
[1] Kyoto Univ, Dept Energy Conserv Sci, Sakyo Ku, Kyoto 6068501, Japan
[2] Kyoto Univ, Grad Sch Engn Sci, Sakyo Ku, Kyoto 6068501, Japan
来源
JSME INTERNATIONAL JOURNAL SERIES A-SOLID MECHANICS AND MATERIAL ENGINEERING | 1998年 / 41卷 / 03期
关键词
bending strength; ceramic coating; sputtering; borosilicate glass; alumina; silicon carbide;
D O I
10.1299/jsmea.41.332
中图分类号
TH [机械、仪表工业];
学科分类号
0802 ;
摘要
Bending strength of ceramics coated glass was investigated from two aspects, concerning effects of the sputtering condition and the difference of target material on the strength. In this work, a borosilicate glass was coated with an alumina or a silicon carbide by a radio-frequency magnetron sputtering method under various conditions. Three-point bending tests of coated materials and the glass substrate were carried out. The strength of coated material was improved compared with that of the glass substrate. The scatter in the strength of coated materials appeared to be comparable with or less than the strength scatter of the glass substrate. Although monolithic alumina is usually weaker than monolithic silicon carbide, the strength of alumina coated materials was found to be higher than that of silicon carbide coated materials. This tendency was explained by a tensile thermal stress generated in silicon carbide coated materials, in which substrates were initially pre-heated.
引用
收藏
页码:332 / 337
页数:6
相关论文
共 13 条
[1]  
*136 COMM FUT OR M, 1998, HDB FIN CER TECHN
[2]   PREPARATION OF CONDUCTING AND TRANSPARENT THIN-FILMS OF TIN-DOPED INDIUM OXIDE BY MAGNETRON SPUTTERING [J].
BUCHANAN, M ;
WEBB, JB ;
WILLIAMS, DF .
APPLIED PHYSICS LETTERS, 1980, 37 (02) :213-215
[3]   EFFECT OF POROSITY ON PHYSICAL PROPERTIES OF SINTERED ALUMINA [J].
COBLE, RL ;
KINGERY, WD .
JOURNAL OF THE AMERICAN CERAMIC SOCIETY, 1956, 39 (11) :377-385
[4]  
Hoshide T, 1996, MATER SCI RES INT, V2, P33
[5]  
Hoshide T, 1996, MATER SCI RES INT, V2, P220
[6]  
HOSHIDE T, 1988, J SOC MATER SCI JPN, V421, P9
[7]   PIEZOELECTRIC THIN-FILMS OF RF-SPUTTERED BI12PBO19 [J].
MITSUYU, T ;
WASA, K ;
HAYAKAWA, S .
JOURNAL OF APPLIED PHYSICS, 1976, 47 (07) :2901-2902
[8]  
NASH WA, 1972, THEORY PROBLEMS STRE, P175
[9]   HIGHLY ORIENTED ZNO FILMS BY RF SPUTTERING OF HEMISPHERICAL ELECTRODE SYSTEM [J].
OHJI, K ;
TOHDA, T ;
WASA, K ;
HAYAKAWA, S .
JOURNAL OF APPLIED PHYSICS, 1976, 47 (04) :1726-1728
[10]   THIN-FILM BI2WO6 [J].
PAYNE, DA ;
MUKHERJEE, JL .
APPLIED PHYSICS LETTERS, 1976, 29 (11) :748-750