Nanolithography and manipulation of graphene using an atomic force microscope
被引:124
作者:
Giesbers, A. J. M.
论文数: 0引用数: 0
h-index: 0
机构:
Radboud Univ Nijmegen, Inst Mol & Mat, High Field Magnet Lab, NL-6525 ED Nijmegen, NetherlandsRadboud Univ Nijmegen, Inst Mol & Mat, High Field Magnet Lab, NL-6525 ED Nijmegen, Netherlands
Giesbers, A. J. M.
[1
]
Zeitler, U.
论文数: 0引用数: 0
h-index: 0
机构:
Radboud Univ Nijmegen, Inst Mol & Mat, High Field Magnet Lab, NL-6525 ED Nijmegen, NetherlandsRadboud Univ Nijmegen, Inst Mol & Mat, High Field Magnet Lab, NL-6525 ED Nijmegen, Netherlands
Zeitler, U.
[1
]
Neubeck, S.
论文数: 0引用数: 0
h-index: 0
机构:
Univ Manchester, Dept Phys, Manchester M13 9PL, Lancs, EnglandRadboud Univ Nijmegen, Inst Mol & Mat, High Field Magnet Lab, NL-6525 ED Nijmegen, Netherlands
Neubeck, S.
[2
]
Freitag, F.
论文数: 0引用数: 0
h-index: 0
机构:
Univ Manchester, Dept Phys, Manchester M13 9PL, Lancs, EnglandRadboud Univ Nijmegen, Inst Mol & Mat, High Field Magnet Lab, NL-6525 ED Nijmegen, Netherlands
Freitag, F.
[2
]
Novoselov, K. S.
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h-index: 0
机构:
Univ Manchester, Dept Phys, Manchester M13 9PL, Lancs, EnglandRadboud Univ Nijmegen, Inst Mol & Mat, High Field Magnet Lab, NL-6525 ED Nijmegen, Netherlands
Novoselov, K. S.
[2
]
Maan, J. C.
论文数: 0引用数: 0
h-index: 0
机构:
Radboud Univ Nijmegen, Inst Mol & Mat, High Field Magnet Lab, NL-6525 ED Nijmegen, NetherlandsRadboud Univ Nijmegen, Inst Mol & Mat, High Field Magnet Lab, NL-6525 ED Nijmegen, Netherlands
Maan, J. C.
[1
]
机构:
[1] Radboud Univ Nijmegen, Inst Mol & Mat, High Field Magnet Lab, NL-6525 ED Nijmegen, Netherlands
[2] Univ Manchester, Dept Phys, Manchester M13 9PL, Lancs, England
graphene;
nanolithography;
atomic force microscopy;
D O I:
10.1016/j.ssc.2008.06.027
中图分类号:
O469 [凝聚态物理学];
学科分类号:
070205 ;
摘要:
We use an atomic force microscope (AFM) to manipulate graphene films on a nanoscopic length scale. By means of local anodic oxidation with an AFM we are able to structure isolating trenches into single-layer and few-layer graphene flakes, opening the possibility of tabletop graphene based device fabrication. Trench sizes of less than 30 nm in width are attainable with this technique. Besides oxidation we also show the influence of mechanical peeling and scratching with an AFM of few layer graphene sheets placed on different substrates. (c) 2008 Elsevier Ltd. All rights reserved.
机构:
Columbia Univ, Dept Phys, New York, NY 10027 USAColumbia Univ, Dept Phys, New York, NY 10027 USA
Bolotin, K. I.
;
Sikes, K. J.
论文数: 0引用数: 0
h-index: 0
机构:
Columbia Univ, Dept Appl Phys, New York, NY 10027 USAColumbia Univ, Dept Phys, New York, NY 10027 USA
Sikes, K. J.
;
Jiang, Z.
论文数: 0引用数: 0
h-index: 0
机构:
Columbia Univ, Dept Phys, New York, NY 10027 USA
Natl High Magnet Field Lab, Tallahassee, FL 32310 USAColumbia Univ, Dept Phys, New York, NY 10027 USA
Jiang, Z.
;
Klima, M.
论文数: 0引用数: 0
h-index: 0
机构:
Columbia Univ, Dept Mech Engn, New York, NY 10027 USAColumbia Univ, Dept Phys, New York, NY 10027 USA
Klima, M.
;
Fudenberg, G.
论文数: 0引用数: 0
h-index: 0
机构:
Columbia Univ, Dept Phys, New York, NY 10027 USAColumbia Univ, Dept Phys, New York, NY 10027 USA
Fudenberg, G.
;
Hone, J.
论文数: 0引用数: 0
h-index: 0
机构:
Columbia Univ, Dept Mech Engn, New York, NY 10027 USAColumbia Univ, Dept Phys, New York, NY 10027 USA
Hone, J.
;
Kim, P.
论文数: 0引用数: 0
h-index: 0
机构:
Columbia Univ, Dept Phys, New York, NY 10027 USAColumbia Univ, Dept Phys, New York, NY 10027 USA
Kim, P.
;
Stormer, H. L.
论文数: 0引用数: 0
h-index: 0
机构:
Columbia Univ, Dept Phys, New York, NY 10027 USA
Columbia Univ, Dept Appl Phys, New York, NY 10027 USA
Alcatel Lucent Technol, Bell Labs, Murray Hill, NJ 07974 USAColumbia Univ, Dept Phys, New York, NY 10027 USA
机构:
Columbia Univ, Dept Phys, New York, NY 10027 USAColumbia Univ, Dept Phys, New York, NY 10027 USA
Bolotin, K. I.
;
Sikes, K. J.
论文数: 0引用数: 0
h-index: 0
机构:
Columbia Univ, Dept Appl Phys, New York, NY 10027 USAColumbia Univ, Dept Phys, New York, NY 10027 USA
Sikes, K. J.
;
Jiang, Z.
论文数: 0引用数: 0
h-index: 0
机构:
Columbia Univ, Dept Phys, New York, NY 10027 USA
Natl High Magnet Field Lab, Tallahassee, FL 32310 USAColumbia Univ, Dept Phys, New York, NY 10027 USA
Jiang, Z.
;
Klima, M.
论文数: 0引用数: 0
h-index: 0
机构:
Columbia Univ, Dept Mech Engn, New York, NY 10027 USAColumbia Univ, Dept Phys, New York, NY 10027 USA
Klima, M.
;
Fudenberg, G.
论文数: 0引用数: 0
h-index: 0
机构:
Columbia Univ, Dept Phys, New York, NY 10027 USAColumbia Univ, Dept Phys, New York, NY 10027 USA
Fudenberg, G.
;
Hone, J.
论文数: 0引用数: 0
h-index: 0
机构:
Columbia Univ, Dept Mech Engn, New York, NY 10027 USAColumbia Univ, Dept Phys, New York, NY 10027 USA
Hone, J.
;
Kim, P.
论文数: 0引用数: 0
h-index: 0
机构:
Columbia Univ, Dept Phys, New York, NY 10027 USAColumbia Univ, Dept Phys, New York, NY 10027 USA
Kim, P.
;
Stormer, H. L.
论文数: 0引用数: 0
h-index: 0
机构:
Columbia Univ, Dept Phys, New York, NY 10027 USA
Columbia Univ, Dept Appl Phys, New York, NY 10027 USA
Alcatel Lucent Technol, Bell Labs, Murray Hill, NJ 07974 USAColumbia Univ, Dept Phys, New York, NY 10027 USA