Nanolithography and manipulation of graphene using an atomic force microscope

被引：124

作者：

Giesbers, A. J. M. ^{[1
]}

Zeitler, U. ^{[1
]}

Neubeck, S. ^{[2
]}

Freitag, F. ^{[2
]}

Novoselov, K. S. ^{[2
]}

Maan, J. C. ^{[1
]}

机构：

[1] Radboud Univ Nijmegen, Inst Mol & Mat, High Field Magnet Lab, NL-6525 ED Nijmegen, Netherlands

[2] Univ Manchester, Dept Phys, Manchester M13 9PL, Lancs, England

来源：

SOLID STATE COMMUNICATIONS | 2008年 / 147卷 / 9-10期

关键词：

graphene; nanolithography; atomic force microscopy;

D O I：

10.1016/j.ssc.2008.06.027

中图分类号：

O469 [凝聚态物理学];

学科分类号：

070205 ;

摘要：

We use an atomic force microscope (AFM) to manipulate graphene films on a nanoscopic length scale. By means of local anodic oxidation with an AFM we are able to structure isolating trenches into single-layer and few-layer graphene flakes, opening the possibility of tabletop graphene based device fabrication. Trench sizes of less than 30 nm in width are attainable with this technique. Besides oxidation we also show the influence of mechanical peeling and scratching with an AFM of few layer graphene sheets placed on different substrates. (c) 2008 Elsevier Ltd. All rights reserved.

引用

页码：366 / 369

页数：4

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