Fabrication of large area subwavelength antireflection structures on Si using trilayer resist nanoimprint lithography and liftoff

被引:211
作者
Yu, ZN [1 ]
Gao, H [1 ]
Wu, W [1 ]
Ge, HX [1 ]
Chou, SY [1 ]
机构
[1] Princeton Univ, Nanostruct Lab, Dept Elect Engn, Princeton, NJ 08544 USA
来源
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 2003年 / 21卷 / 06期
关键词
D O I
10.1116/1.1619958
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
In this article we report on the fabrication of subwavelength antireflection structures on silicon substrates using a trilayer resist nanoimprint lithography and liftoff process. We have fabricated cone-shaped nanoscale silicon pillars with a continuous effective index gradient, which greatly enhances its antireflective performances. Our measurements show that the two-dimensional subwavelength structure effectively suppresses surface reflection over a wide spectral bandwidth and a large field of view. A reflectivity of 0.3% was measured at 632.8 nm wavelength, which is less than 1% of the flat silicon surface reflectivity. (C) 2003 American Vacuum Society.
引用
收藏
页码:2874 / 2877
页数:4
相关论文
共 16 条
[1]   Imprint lithography with 25-nanometer resolution [J].
Chou, SY ;
Krauss, PR ;
Renstrom, PJ .
SCIENCE, 1996, 272 (5258) :85-87
[2]   Analysis of distortion in interferometric lithography [J].
Ferrera, J ;
Schattenburg, ML ;
Smith, HI .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1996, 14 (06) :4009-4013
[3]   OPTIMAL-DESIGN FOR ANTIREFLECTIVE TAPERED 2-DIMENSIONAL SUBWAVELENGTH GRATING STRUCTURES [J].
GRANN, EB ;
MOHARAM, MG ;
POMMET, DA .
JOURNAL OF THE OPTICAL SOCIETY OF AMERICA A-OPTICS IMAGE SCIENCE AND VISION, 1995, 12 (02) :333-339
[4]   Reflection properties of nanostructure-arrayed silicon surfaces [J].
Hadobás, K ;
Kirsch, S ;
Carl, A ;
Acet, M ;
Wassermann, EF .
NANOTECHNOLOGY, 2000, 11 (03) :161-164
[5]   Molecular dynamics simulation of sputter trench-filling morphology in damascene process [J].
Ju, SP ;
Weng, CI ;
Chang, JG ;
Hwang, CC .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 2002, 20 (03) :946-955
[6]   Broadband antireflection gratings fabricated upon silicon substrates [J].
Kanamori, Y ;
Sasaki, M ;
Hane, K .
OPTICS LETTERS, 1999, 24 (20) :1422-1424
[7]   100 nm period silicon antireflection structures fabricated using a porous alumina membrane mask [J].
Kanamori, Y ;
Hane, K ;
Sai, H ;
Yugami, H .
APPLIED PHYSICS LETTERS, 2001, 78 (02) :142-143
[8]   Antireflection microstructures fabricated upon fluorine-doped SiO2 films [J].
Kintaka, K ;
Nishii, J ;
Mizutani, A ;
Kikuta, H ;
Nakano, H .
OPTICS LETTERS, 2001, 26 (21) :1642-1644
[9]   Antireflection behavior of silicon subwavelength periodic structures for visible light [J].
Lalanne, P ;
Morris, GM .
NANOTECHNOLOGY, 1997, 8 (02) :53-56
[10]   PYRAMID-ARRAY SURFACE-RELIEF STRUCTURES PRODUCING ANTIREFLECTION INDEX MATCHING ON OPTICAL-SURFACES [J].
SOUTHWELL, WH .
JOURNAL OF THE OPTICAL SOCIETY OF AMERICA A-OPTICS IMAGE SCIENCE AND VISION, 1991, 8 (03) :549-553