Analysis of distortion in interferometric lithography

被引:51
作者
Ferrera, J [1 ]
Schattenburg, ML [1 ]
Smith, HI [1 ]
机构
[1] MIT,CAMBRIDGE,MA 02139
来源
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1996年 / 14卷 / 06期
关键词
D O I
10.1116/1.588633
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
We present a mathematical model to describe the spatial phase of gratings produced by interferometric lithography, as well as a set of experiments to verify the model's validity and to measure any distortions introduced when the lithography is performed. The implementation of two methods to measure the phase progression of these gratings is described. We find the results obtained from an initial set of experiments to be in good agreement with the theoretical model, i.e., the absence of significant distortions, such as coherent phase noise, is confirmed. These results arealso applicable to the metrology of grids. (C) 1996 American Vacuum Society.
引用
收藏
页码:4009 / 4013
页数:5
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