Design and performance of capping layers for extreme-ultraviolet multilayer mirrors

被引：78

作者：

Bajt, SA

Chapman, HN

Nguyen, N

Alameda, J

Robinson, JC

Malinowski, M

Gullikson, E

Aquila, A

Tarrio, C

Grantham, S

机构：

[1] Lawrence Livermore Natl Lab, Livermore, CA 94550 USA

[2] Sandia Natl Labs, Livermore, CA 94550 USA

[3] Lawrence Berkeley Lab, Ctr Xray Opt, Berkeley, CA 94720 USA

[4] NIST, Gaithersburg, MD 20899 USA

来源：

APPLIED OPTICS | 2003年 / 42卷 / 28期

关键词：

D O I：

10.1364/AO.42.005750

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

Multilayer lifetime has emerged as one of the major issues for the commercialization of extreme-ultraviolet lithography (EUVL). We describe the performance of an oxidation-resistant capping layer of Ru atop multilayers that results in a reflectivity above 69% at 13.2 nm, which is suitable for EUVL projection optics and has been tested with accelerated electron-beam and extreme-ultraviolet (ELTV) light in a water-vapor environment. Based on accelerated exposure results, we calculated multilayer lifetimes for all reflective mirrors in a typical commercial EUVL tool and concluded that Ru-capped multilayers have similar to40X longer lifetimes than Si-capped multilayers, which translates to 3 months to many years, depending on the mirror dose. (C) 2003 Optical Society of America.

引用

页码：5750 / 5758

页数：9

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