Design and performance of capping layers for extreme-ultraviolet multilayer mirrors

被引：78

作者：

Bajt, SA

Chapman, HN

Nguyen, N

Alameda, J

Robinson, JC

Malinowski, M

Gullikson, E

Aquila, A

Tarrio, C

Grantham, S

机构：

[1] Lawrence Livermore Natl Lab, Livermore, CA 94550 USA

[2] Sandia Natl Labs, Livermore, CA 94550 USA

[3] Lawrence Berkeley Lab, Ctr Xray Opt, Berkeley, CA 94720 USA

[4] NIST, Gaithersburg, MD 20899 USA

来源：

APPLIED OPTICS | 2003年 / 42卷 / 28期

关键词：

D O I：

10.1364/AO.42.005750

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

Multilayer lifetime has emerged as one of the major issues for the commercialization of extreme-ultraviolet lithography (EUVL). We describe the performance of an oxidation-resistant capping layer of Ru atop multilayers that results in a reflectivity above 69% at 13.2 nm, which is suitable for EUVL projection optics and has been tested with accelerated electron-beam and extreme-ultraviolet (ELTV) light in a water-vapor environment. Based on accelerated exposure results, we calculated multilayer lifetimes for all reflective mirrors in a typical commercial EUVL tool and concluded that Ru-capped multilayers have similar to40X longer lifetimes than Si-capped multilayers, which translates to 3 months to many years, depending on the mirror dose. (C) 2003 Optical Society of America.

引用

页码：5750 / 5758

页数：9

共 22 条

[11] Radiation-induced protective carbon coating for extreme ultraviolet optics [J].

Klebanoff, LE ;

Clift, WM ;

Malinowski, ME ;

Steinhaus, C ;

Grunow, P ;

Bajt, S .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 2002, 20 (02) :696-703

[12] First environmental data from the EUV engineering test stand [J].

Klebanoff, LE ;

Malinowski, ME ;

Grunow, P ;

Clift, WM ;

Steinhaus, C ;

Leung, AH ;

Haney, SJ .

EMERGING LITHOGRAPHIC TECHNOLOGIES V, 2001, 4343 :342-346

[13] Molecular contamination mitigation in EUVL by environmental control [J].

Koster, N ;

Mertens, B ;

Jansen, R ;

van de Runstraat, A ;

Stietz, F ;

Wedowski, M ;

Meiling, H ;

Klein, R ;

Gottwald, A ;

Scholze, F ;

Visser, M ;

Kurt, R ;

Zalm, P ;

Louis, E ;

Yakshin, A .

MICROELECTRONIC ENGINEERING, 2002, 61-2 :65-76

[14] Progress in Mo/Si multilayer coating technology for EUVL optics [J].

Louis, E ;

Yakshin, AE ;

Görts, PC ;

Oestreich, S ;

Stuik, R ;

Maas, ELG ;

Kessels, MJH ;

Bijkerk, F ;

Haidl, M ;

Müllender, S ;

Mertin, M ;

Schmitz, D ;

Scholze, F ;

Ulm, G .

EMERGING LITHOGRAPHIC TECHNOLOGIES IV, 2000, 3997 :406-411

[15] Use of molecular oxygen to reduce EUV-induced carbon contamination of optics [J].

Malinowski, M ;

Grunow, P ;

Steinhaus, C ;

Clift, M ;

Klebanoff, L .

EMERGING LITHOGRAPHIC TECHNOLOGIES V, 2001, 4343 :347-356

[16] Multilayer reflectance during exposure to EUV radiation [J].

Oestreich, S ;

Klein, R ;

Scholze, F ;

Jonkers, J ;

Louis, E ;

Yakshin, A ;

Görts, P ;

Ulm, G ;

Haidl, M ;

Bijkerk, F .

SOFT X-RAY AND EUV IMAGING SYSTEMS, 2000, 4146 :64-71

[17] Extreme-ultraviolet multilayer mirrors deposited using radio-frequency-magnetron sputtering: the influence of self-bias voltage on reflectivity and roughness [J].

Putero-Vuaroqueaux, M ;

Vidal, B .

JOURNAL OF PHYSICS-CONDENSED MATTER, 2001, 13 (18) :3969-3976

[18]

SHIRAISHI M, 2003, P SOC PHOTO-OPT INS, V5037, P247

[19] Capping layers for extreme-ultraviolet multilayer interference coatings [J].

Singh, M ;

Braat, JJM .

OPTICS LETTERS, 2001, 26 (05) :259-261

[20] High-performance Mo-Si multilayer coatings for extreme-ultraviolet lithography by ion-beam deposition [J].

Spiller, E ;

Baker, SL ;

Mirkarimi, PB ;

Sperry, V ;

Gullikson, EM ;

Stearns, DG .

APPLIED OPTICS, 2003, 42 (19) :4049-4058

← 1 2 3 →