Heavy-ion induced modification of lithium fluoride observed by scanning force microscopy

被引:14
作者
Muller, A [1 ]
Neumann, R [1 ]
Schwartz, K [1 ]
Steckenreiter, T [1 ]
Trautmann, C [1 ]
机构
[1] Gesell Schwerionenforsch, D-64291 Darmstadt, Germany
来源
APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING | 1998年 / 66卷 / Suppl 1期
关键词
D O I
10.1007/s003390051315
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
In order to study ion-induced damage in single crystals of lithium fluoride with scanning force microscopy (SFM), samples are irradiated with several, heavy-ion species with kinetic energy of 11.4 MeV per nucleon. As concluded from a previous analysis of ion tracks in LiF by optical absorption spectroscopy and small-angle X-ray scattering, single point defects occur in a track halo with a radius in the range 15-30 nm, whereas defect aggregates are formed in a track core region possessing a radius of only 1-2 nm. These aggregates can be attacked by chemical etching if the energy loss along the ion trajectory surpasses a critical value of about 1 keV/Angstrom. SFM images of etched as well as unetched sample surfaces reveal new damage characteristics: etched ion-track profiles directed parallel to the ion trajectories exhibit a sequence of single etch pits with an average distance between them of about 140 nm. After exposure to heavy-ion irradiation at normal incidence, the unetched LiF surface is covered with round hillocks with a mean diameter of 55 (8) nm and heights of the order of 3 nm.
引用
收藏
页码:S1147 / S1150
页数:4
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