Effect of low-temperature annealing on transport and magnetism of diluted magnetic semiconductor (Ga, Mn)As

被引:238
作者
Hayashi, T
Hashimoto, Y
Katsumoto, S
Iye, Y
机构
[1] Univ Tokyo, Inst Solid State Phys, Chiba 2778581, Japan
[2] Japan Sci & Technol Corp, CREST, Tokyo 1710031, Japan
关键词
D O I
10.1063/1.1352701
中图分类号
O59 [应用物理学];
学科分类号
摘要
We report improvements in the crystallinity of a III-V-based diluted magnetic semiconductor (Ga, Mn)As by heat treatment (annealing) after growth at comparatively low temperatures. This method can be used to raise the Curie temperature to 100 K without the need for severe optimization of growth conditions, as well as to adjust the material parameters to desired values. (C) 2001 American Institute of Physics.
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页码:1691 / 1693
页数:3
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