Phonon-limited mobility in n-type single-layer MoS2 from first principles

被引:1101
作者
Kaasbjerg, Kristen [1 ]
Thygesen, Kristian S. [1 ]
Jacobsen, Karsten W. [1 ]
机构
[1] Tech Univ Denmark, Dept Phys, Ctr Atom Scale Mat Design CAMD, DK-2800 Lyngby, Denmark
关键词
D O I
10.1103/PhysRevB.85.115317
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
We study the phonon-limited mobility in intrinsic n-type single-layer MoS2 for temperatures T > 100 K. The materials properties including the electron-phonon interaction are calculated from first principles and the deformation potentials and Frohlich interaction in single-layer MoS2 are established. The calculated room-temperature mobility of similar to 410 cm(2)V(-1)s(-1) is found to be dominated by optical phonon scattering via intra and intervalley deformation potential couplings and the Frohlich interaction. The mobility is weakly dependent on the carrier density and follows a mu similar to T-gamma temperature dependence with gamma = 1.69 at room temperature. It is shown that a quenching of the characteristic homopolar mode, which is likely to occur in top-gated samples, increases the mobility with similar to 70 cm(2)V(-1)s(-1) and can be observed as a decrease in the exponent to. = 1.52. In comparison to recent experimental findings for the mobility in single-layer MoS2 (similar to 200 cm(2)V(-1)s(-1)), our results indicate that mobilities close to the intrinsic phonon-limited mobility can be achieved in two-dimensional materials via dielectric engineering that effectively screens static Coulomb scattering on, e.g., charged impurities.
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页数:16
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