Ultrahigh electron mobility in suspended graphene

被引:6637
作者
Bolotin, K. I. [1 ]
Sikes, K. J. [2 ]
Jiang, Z. [1 ,4 ]
Klima, M. [3 ]
Fudenberg, G. [1 ]
Hone, J. [3 ]
Kim, P. [1 ]
Stormer, H. L. [1 ,2 ,5 ]
机构
[1] Columbia Univ, Dept Phys, New York, NY 10027 USA
[2] Columbia Univ, Dept Appl Phys, New York, NY 10027 USA
[3] Columbia Univ, Dept Mech Engn, New York, NY 10027 USA
[4] Natl High Magnet Field Lab, Tallahassee, FL 32310 USA
[5] Alcatel Lucent Technol, Bell Labs, Murray Hill, NJ 07974 USA
基金
美国国家科学基金会;
关键词
graphene; nanofabrication; electronic transport;
D O I
10.1016/j.ssc.2008.02.024
中图分类号
O469 [凝聚态物理学];
学科分类号
070205 ;
摘要
We have achieved mobilities in excess of 200,000 cm(2) V(-1)s(-1) at electron densities of similar to 2x10(11) cm(-2) by suspending single layer graphene. Suspension similar to 150 nin above a Si/SiO2 gate electrode and electrical contacts to the graphene was achieved by a combination of electron beam lithography and etching. The specimens were cleaned in situ by employing current-induced heating, directly resulting in a significant improvement of electrical transport. Concomitant with large mobility enhancement, the widths of the characteristic Dirac peaks are reduced by a factor of 10 compared to traditional, nonsuspended devices. This advance should allow for accessing the intrinsic transport properties of graphene. (C) 2008 Elsevier Ltd. All rights reserved.
引用
收藏
页码:351 / 355
页数:5
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