Controllable fabrication of SiGe/Si and SiGe/Si/Cr helical nanobelts

被引:103
作者
Zhang, L [1 ]
Deckhardt, E
Weber, A
Schönenberger, C
Grützmacher, D
机构
[1] Paul Scherrer Inst, Lab Micro & Nanotechnol, CH-5232 Villigen, Switzerland
[2] Univ Basel, Inst Phys, CH-4056 Basel, Switzerland
关键词
D O I
10.1088/0957-4484/16/6/006
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
Helical nanobelts of SiGe/Si and SiGe/Si/Cr are fabricated by rolling up strained thin heterostructures. The fabrication involved electron beam lithography, reactive ion etching, and wet chemical etching steps followed by a drying procedure. All parameters of the helical nanobelts, namely their helical angle, chirality, pitch and diameter, are controllable in a reproducible fashion. The ease of fabrication of SiGe/Si and hybrid helical nanobelts opens new paths for the fabrication technology of micro- or nanoscale sensors, transducers, resonators and cylindrical shaped micro-capacitors.
引用
收藏
页码:655 / 663
页数:9
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