Simulation of pulsed electrodeposition for giant magnetoresistance FeCoNiCu/Cu multilayers

被引：26

作者：

Huang, Q ^{[1
]}

Podlaha, EJ ^{[1
]}

机构：

[1] Louisiana State Univ, Gordon A & Mary Cain Dept Chem Engn, Baton Rouge, LA 70803 USA

来源：

JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 2004年 / 151卷 / 02期

关键词：

D O I：

10.1149/1.1637356

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

A model describing the electrodeposition of FeCoNiCu/Cu nanometric multilayers was developed to simulate both steady-state and pulsed deposition onto a ring-disk electrode. The transient model includes a two-step adsorption mechanism for the description of anomalous codeposition, convective-diffusion mass transport and a displacement mechanism for pulses to zero current. Changes in deposit composition were predicted with various pulse times as a tool for assessing interfacial compositional gradients in multilayer deposits. (C) 2004 The Electrochemical Society.

引用

页码：C119 / C126

页数：8

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