The two-dimensional lateral injection in-plane laser

被引:21
作者
North, A [1 ]
Burroughes, J
Burke, T
Shields, A
Norman, CE
Pepper, M
机构
[1] Univ Cambridge, Cavendish Lab, Semicond Phys Dept, Cambridge CB3 0HE, England
[2] Toshiba Cambridge Res Ctr, Cambridge CB4 4WE, England
基金
英国工程与自然科学研究理事会;
关键词
charge injection; hot carriers; quantum-well lasers; semiconductor device doping; semiconductor junctions; ultrafast electronics;
D O I
10.1109/3.748840
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
In this paper, a two-dimensional (2-D) p-n junction was used for population inversion in a GaAs quantum-well laser. The device, incorporating modulation doping within the core of a separate confinement heterostructure, was designed to exploit the amphoteric behavior of silicon in GaAs [doping p-type on (311)A facets and n-type on (100)]. It is believed to be the first lasing de,ice to use an amphoterically doped junction for population inversion. In the first attempted design (described here), CW lasing was achieved at temperatures up to 90 K. The factors affecting the temperature dependence of threshold are discussed in the context of possible design improvements, The device may eventually show improved modulation bandwidth over conventional vertical injection lasers with bulk contacts, since its geometry and the 2-D nature of the injection offer reduced capacitance, HEMT integration, and an elimination of carrier capture problems.
引用
收藏
页码:352 / 357
页数:6
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