Measurement of absolute CH3 concentration in a hot-filament reactor using cavity ring-down spectroscopy

被引：47

作者：

Wahl, EH ^{[1
]}

Owano, TG ^{[1
]}

Kruger, CH ^{[1
]}

Zalicki, P ^{[1
]}

Ma, Y ^{[1
]}

Zare, RN ^{[1
]}

机构：

[1] STANFORD UNIV,DEPT CHEM,STANFORD,CA 94305

来源：

关键词：

CVD; diamond; methyl radical; UV absorption spectroscopy;

D O I：

10.1016/0925-9635(95)00359-2

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

Methyl radicals were generated in a hot-filament diamond synthesis reactor using a resistively heated tungsten filament (length, 20 mm) in a slowly flowing mixture of 0.5% CH4 in H-2. The UV absorbance of CH3 was measured during deposition using a new line-of-sight optical technique called cavity ring-down spectroscopy (CRDS). Measurements were carried out at 213.9 mm, a wavelength at which the CH3 absorption cross-section has been shown by others to be independent of the temperature over a large range. We observed that the CH3 absolute concentration varied strongly as a function of the position between the substrate and the filament, and its value was strongly influenced by the substrate temperature.

引用

页码：373 / 377

页数：5

共 24 条

[1] DIRECT MONITORING OF CH3 IN A FILAMENT-ASSISTED DIAMOND CHEMICAL VAPOR-DEPOSITION REACTOR [J].