Stoichiometry of Pt Submonolayer Deposition via Surface-Limited Redox Replacement Reaction

被引：82

作者：

Gokcen, Dincer ^{[1
]}

Bae, Sang-Eun ^{[1
]}

Brankovic, Stanko R. ^{[1
,2
,3
]}

机构：

[1] Univ Houston, Elect & Comp Engn Dept, Houston, TX 77004 USA

[2] Univ Houston, Chem & Biomol Engn Dept, Houston, TX USA

[3] Univ Houston, Dept Chem, Houston, TX USA

来源：

JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 2010年 / 157卷 / 11期

基金：

美国国家科学基金会;

关键词：

PLATINUM-MONOLAYER ELECTROCATALYSTS; SCANNING-TUNNELING-MICROSCOPY; ENHANCED RAMAN-SCATTERING; OXYGEN-REDUCTION; UNDERPOTENTIAL DEPOSITION; ELECTROCHEMICAL DEPOSITION; EPITAXIAL-GROWTH; AU(111); METAL; CU;

D O I：

10.1149/1.3490416

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

The work exploring the stoichiometry of Pt deposition via surface-limited redox replacement of the underpotentially deposited (UPD) Cu monolayer on Au(111) is presented. The Cu UPD monolayer is formed from 10(-3) M Cu(2+) + 0.1 M HClO(4) solution, whereas the Pt deposition via surface-limited redox replacement reaction is carried out in 10(-3) M {PtCl(6)}(2-) + 0.1 M HClO(4) solution at open-circuit potential. Our results indicate that the Pt submonolayers have two-dimensional morphology and linear dependence of their coverage on the amount (coverage) of the replaced Cu UPD monolayers. Our analysis shows that the oxidation state of Cu during redox replacement reaction is 1+, suggesting that four Cu UPD adatoms are replaced by each deposited Pt adatom. This work stresses the general importance of the anions, determining the stoichiometry of metal deposition reaction via surface-limited redox replacement of the UPD monolayers. (c) 2010 The Electrochemical Society. [DOI: 10.1149/1.3490416] All rights reserved.

引用

页码：D582 / D587

页数：6

共 33 条

[11] EFFECT OF TRACE AMOUNTS OF CL- IN CU UNDERPOTENTIAL DEPOSITION ON AU(111) IN PERCHLORATE SOLUTIONS - AN IN-SITU SCANNING-TUNNELING-MICROSCOPY STUDY [J].