InAs/InP(001) quantum wire formation due to anisotropic stress relaxation:: in situ stress measurements

被引:76
作者
García, JM [1 ]
González, L [1 ]
González, MU [1 ]
Silveira, JP [1 ]
González, Y [1 ]
Briones, F [1 ]
机构
[1] CSIC, CNM, Inst Microelect Madrid, Madrid 28760, Spain
关键词
nanostructures; stresses; molecular beam epitaxy; semiconducting III-V materials;
D O I
10.1016/S0022-0248(01)00962-9
中图分类号
O7 [晶体学];
学科分类号
0702 ; 070205 ; 0703 ; 080501 ;
摘要
We report in situ and in real time quantitative measurements of stress along [1 1 0] and [1 1 0] directions during the formation of InAs/InP(0 0 1) quantum wires (QWr) and consequent stress relaxation. Results show a strong stress anisotropy due to the distortion of As-In bonds along [1 1 0] and As-As dimerization along [1 1 0]. This anisotropy is claimed to be the origin of QWr formation instead of self-assembled quantum dots. Anisotropic stress relaxation associated to QWr formation is shown to be characteristic of heteroepitaxial systems involving different group V elements grown by MBE under group V stabilized surface (2 x 4 reconstruction). (C) 2001 Elsevier Science B.V. All rights reserved.
引用
收藏
页码:975 / 979
页数:5
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